Graduation Term
Spring 2026
Degree Name
Doctor of Philosophy (PhD)
Department
Department of Educational Administration and Foundations: Educational Administration
Committee Chair
Lydia Kyei-Blankson
Committee Co-Chair
Francis Godwyll
Committee Member
Ryan Hendrickson
Abstract
This qualitative narrative study explored how international student affairs administrators in the United States experience acculturation. Guided by Berry’s (1997) fourfold model of acculturation, the study examined how participants experienced assimilation, integration, separation, and marginalization as they navigated their professional roles, institutional expectations, and cultural identities. Eight participants, representing diverse countries of origin, institutional types, and professional roles, were interviewed using a semi-structured interview guide. Data were analyzed using Braun and Clarke's (2006) framework. Findings indicated participants employed multiple, context-dependent acculturation strategies rather than adhering to a single strategy. Assimilation emerged as a strategic process for establishing professional legitimacy, navigating U.S. professional norms, and supporting career and immigration security. Integration was achieved through bicultural navigation and relational belonging, enabling participants to maintain their cultural identities while actively engaging in U.S. higher education contexts. Separation functioned as an intentional strategy to preserve participants’ cultures of origin. Marginalization was not a dominant acculturation strategy but emerged situationally, shaped by structural and institutional barriers. Overall, the findings indicate acculturation among international-born student affairs administrators is dynamic, situational, and shaped by organizational contexts.
Access Type
Dissertation-Open Access
Recommended Citation
Webb, Amber Joy, "The Acculturation of International-Born Student Affairs Administrators in the United States" (2026). Theses and Dissertations. 2329.
https://ir.library.illinoisstate.edu/etd/2329